Paper Title:
Search for Hydrogen Related Defects in p-Type 6H and 4H-SiC
  Abstract

Al-doped 4H and 6H epitaxial layers have been implanted with 200 keV hydrogen or irradiated with 1 MeV electrons. Heat treatments have been carried out up to 1000 °C and electrical characterization, by means of deep level transient spectroscopy (DLTS), has been performed after every annealing treatment in the 100-750 K temperature range. We have detected several deep levels and the possible involvement of hydrogen in the microscopic structure of these defects is discussed in the light of their thermal stability and previous results found in the literature. All the detected defects, except for a level located at 0.55 eV above the valence band (Ev), do not display any electric field dependence of their emission time constant.

  Info
Periodical
Materials Science Forum (Volumes 600-603)
Edited by
Akira Suzuki, Hajime Okumura, Tsunenobu Kimoto, Takashi Fuyuki, Kenji Fukuda and Shin-ichi Nishizawa
Pages
421-424
DOI
10.4028/www.scientific.net/MSF.600-603.421
Citation
G. Alfieri, T. Kimoto, "Search for Hydrogen Related Defects in p-Type 6H and 4H-SiC ", Materials Science Forum, Vols. 600-603, pp. 421-424, 2009
Online since
September 2008
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