Paper Title:
Study of the Defect Formation of Helium in Nanocrystalline Titanium Films
  Abstract

In this paper, helium-charged nanocrystalline Ti films with different bias voltages were deposited by the He-Ar magnetron co-sputtering method. XRD was used to investigate the microstructure of the He-Ti film. Meanwhile, in order to find out the factors of affecting the growth and size of helium clusters, kinetic Monte Carlo (KMC) simulation was carried out to study the growth of helium cluster, based on the simulation of helium behavior in titanium using molecular dynamics.

  Info
Periodical
Edited by
S. J. Wang, Z. Q. Chen, B. Wang and Y. C. Jean
Pages
192-194
DOI
10.4028/www.scientific.net/MSF.607.192
Citation
J.J. Long, A.H. Deng, Y.L. Zhou, Q. Hou, X.X. Yu, J. Yu, X. Cheng, Y.J. Zhang, L.Q. Shi, "Study of the Defect Formation of Helium in Nanocrystalline Titanium Films", Materials Science Forum, Vol. 607, pp. 192-194, 2009
Online since
November 2008
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