Paper Title:
Sm1-xNdxNiO3 Thin Films Deposition by KrF Laser Ablation
  Abstract

The perovskites RNiO3 (R rare earth ≠ La) are classified as a phase transition metal-insulator. The transition temperature is modulated by the size of the rare earth. The use of compound R1-xR'xNiO3 can vary transition temperature on a wide thermal range depending on the concentration of the two rare earths. The Sm1-xNdxNiO3 (x = 0.45) thin layers have been carried out on (100) silicon substrates by KrF laser ablation (λ = 248 nm, 25ns) at two different fluences 2 and 3 Jcm-2. The oxygen pressure and the target-substrate distance have been maintained at 0.2 mbar and 4 cm respectively. The deposition temperature has been set at 500 ° C. The obtained layers were characterized by X-ray diffraction, atomic force microscopy and Rutherford back scattering diagnostics. The resistivity Measurements were carried out by the conventional four-probe method. The XRD spectra revealed the presence of an ideal cubic perovskite phase. The RBS analysis showed that the deposited layers are rich in oxygen. A correlation between the morphology properties of the deposited layers and the plasma dynamics studied by fast imaging has been found.

  Info
Periodical
Edited by
N.Gabouze
Pages
27-31
DOI
10.4028/www.scientific.net/MSF.609.27
Citation
S. Lafane, T. Kerdja, S. Abdelli-Messaci, S. Malek, M. Maaza, "Sm1-xNdxNiO3 Thin Films Deposition by KrF Laser Ablation", Materials Science Forum, Vol. 609, pp. 27-31, 2009
Online since
January 2009
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Wei Rao, Jun Yu
Abstract:(La0.7Sr0.3)MnO3 (LSMO) thin films were prepared on Si (100) substrate by pulsed laser deposition (PLD). Both structure and surface...
908
Authors: Łukasz Cieniek
Abstract:Functional nonstoichiometric La0.6Ca0.4CoO3 perovskite thin films were deposited on theepi-polished [001]...
25
Authors: Liang Chen, Jin Xiang Deng, Hong Li Gao, Qian Qian Yang, Le Kong, Min Cui, Zi Jia Zhang
Chapter 5: Materials for Electronics and Optoelectronics
Abstract:CH3NH3PbI3 thin film was deposited by a dual-source evaporation system under high vacuum (∼10−4...
440