Materials Science & Technology

FULLTEXT SEARCH
NEW: Advanced Search

Selective Deposition of Titanium Dioxide Thin Film on Glass Monolayers by Impregnating Method

Journal Materials Science Forum (Volumes 610 - 613)
Volume Materials Research
Edited by Zhongwei Gu, Yafang Han, Fusheng Pan, Xitao Wang, Duan Weng and Shaoxiong Zhou
Pages 147-154
DOI 10.4028/www.scientific.net/MSF.610-613.147
Citation Yao Bo Hu et al., 2009, Materials Science Forum, 610-613, 147
Online since January, 2009
Authors Yao Bo Hu, Fu Sheng Pan, Jing Feng Wang
Keywords Selective Deposition, Thin Film, Titanium Dioxide
Abstract

Titanium dioxide (TiO2) thin film was fabricated on the surface of glass monolayers at room temperature, using KH-550 as self-assembled monolayers (SAMs). The TiO2 gel precursor was characterized with differential scanning calorimetry – thermogravimetry (DSC-TG), and the TiO2 powder was analyzed with X-ray diffraction (XRD). The TiO2 thin film was tested with X-ray fluorescence spectroscopy (XRF). With the application of atomic force microscope (AFM) the surface topography of siloxane layer and TiO2 film were studied. Their hydrophilicities were measured. The transmittance of TiO2 film was detected by using dual beam ultraviolet - visible spectrophotometer. The results show that the TiO2 thin film is in monolayer with nanometer level, the deposition is the anatase structure. TiO2 is deposited on the surface instead of channel or gap of siloxane, the hydrophilicities of TiO2 monolayer film are perfect, and TiO2 monolayer film has a good transmissivity in the visible light area.

Full Paper PDF Get the full paper by clicking here

First page example

Preview of first page