Paper Title:
Silicon Carbide Crystalline Films Synthesis out of Organosilicon Monomers Vapors in Reactor with Cold Walls
  Abstract

The possibility of silicon carbide films production out of organosilicon chlorine-containing monomers is under analysis in this research. Silicon carbide films samples were produced by chemical deposition method out of gas phase in reactor with “cold walls”, in the conditions of low pressure. The influence of monomer type, substrate temperature on crystalline SiC films composition is also under consideration. The results of infrared spectroscopy, Raman scattering spectrometry and x-ray phase analysis are presented.

  Info
Periodical
Materials Science Forum (Volumes 615-617)
Edited by
Amador Pérez-Tomás, Philippe Godignon, Miquel Vellvehí and Pierre Brosselard
Pages
173-176
DOI
10.4028/www.scientific.net/MSF.615-617.173
Citation
B. M. Sinelnikov, V. A. Tarala, I. S. Mitchenko, "Silicon Carbide Crystalline Films Synthesis out of Organosilicon Monomers Vapors in Reactor with Cold Walls", Materials Science Forum, Vols. 615-617, pp. 173-176, 2009
Online since
March 2009
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