Paper Title:
Ultra Low Noise Epitaxial 4H-SiC X-Ray Detectors
  Abstract

The design and the experimental results of some prototypes of SiC X-ray detectors are presented. The devices have been manufactured on a 2’’ 4H-SiC wafer with 115 m thick undoped high purity epitaxial layer, which constitutes the detection’s active volume. Pad and pixel detectors based on Ni-Schottky junctions have been tested. The residual doping of the epi-layer was found to be extremely low, 3.7 x 1013 cm-3, allowing to achieve the highest detection efficiency and the lower specific capacitance of the detectors. At +22°C and in operating bias condition, the reverse current densities of the detector’s Schottky junctions have been measured to be between J=0.3 pA/cm2 and J=4 pA/cm2; these values are more than two orders of magnitude lower than those of state of the art silicon detectors. With such low leakage currents, the equivalent electronic noise of SiC pixel detectors is as low as 0.5 electrons r.m.s at room temperature, which represents a new state of the art in the scenario of semiconductor radiation detectors.

  Info
Periodical
Materials Science Forum (Volumes 615-617)
Edited by
Amador Pérez-Tomás, Philippe Godignon, Miquel Vellvehí and Pierre Brosselard
Pages
845-848
DOI
10.4028/www.scientific.net/MSF.615-617.845
Citation
G. Bertuccio, S. Caccia, F. Nava, G. Foti, D. Puglisi, C. Lanzieri, S. Lavanga, G. Abbondanza, D. Crippa, F. Preti, "Ultra Low Noise Epitaxial 4H-SiC X-Ray Detectors", Materials Science Forum, Vols. 615-617, pp. 845-848, 2009
Online since
March 2009
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Price
$32.00
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