Paper Title:
Effective of SiO2 Addition on the Self-Cleaning and Photocatalytic Properties of TiO2 Films by Sol-Gel Process
  Abstract

Thin films of various composition in the system of TiO2•SiO2 have been fabricated by the sol-gel process using Si(OC2H5) and Ti(OC3H7i)4 as precursors. TiO2•SiO2 films were formed on the glass substrate by spin-coating technique and heated at 500°C for 1 h. The relationship between hydrophilicity, photocatalytic properties and self-cleaning property with SiO2 addition and UV light irradiation were investigated. Photocatalytic activity of TiO2•SiO2 films showed decomposition of ~97% of acetaldehyde in 2 h and a water contact angle of ~10°. TiO2•SiO2 films can have more hydrophilic activity and less photocatalytic activity by increasing of SiO2 addition. XPS measurements revealed that the amount of organic compounds adsorbed on the films decreased with the UV light irradiation and SiO2 addition, because of the increased of both OH group contents in films and decomposed organic contaminants of the films surface.

  Info
Periodical
Materials Science Forum (Volumes 620-622)
Edited by
Hyungsun Kim, JienFeng Yang, Tohru Sekino and Soo Wohn Lee
Pages
679-682
DOI
10.4028/www.scientific.net/MSF.620-622.679
Citation
D. Y. Shin, K. N. Kim, "Effective of SiO2 Addition on the Self-Cleaning and Photocatalytic Properties of TiO2 Films by Sol-Gel Process", Materials Science Forum, Vols. 620-622, pp. 679-682, 2009
Online since
April 2009
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Price
$32.00
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Abstract:This work aims to study the effect of ZnO containing in TiO2/SiO2 film on the superhydrophilic property after exposed...
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