Paper Title:
Effect of Annealing on the Optical and Structural Properties of TiO2 RF Sputtered Thin Films
  Abstract

Titanium dioxide (TiO2) thin films were prepared by RF magnetron sputtering technique at an argon flow rate of 4.9 sccm and room temperature during 4 h. These films were deposited on pyrex substrates with an RF power of 300 W and annealed at different temperatures (500, 600, 700 and 800 °C). The optical and structural properties were studied by spectrophotometry and X ray Diffractometry respectively. The obtained results show an amorphous structure for the unheated TiO2 films and an apparition of an anatase phase after the annealing process. The transmittance is increased with an annealing of 500°C from 45 to 80 % in the visible and near-infrared regions. The direct band gap, refractive index, extinction coefficient and grain size were investigated. The reflection in the visible range for a silicon (Si(p)) substrate covered by TiO2 thin films is decreased to be about 20%. The results of this work suggest that the variation of the annealing temperature allow the control of the physical properties of TiO2 thin films as antireflective coating for silicon solar cells.

  Info
Periodical
Materials Science Forum (Volumes 636-637)
Edited by
Luís Guerra ROSA and Fernanda MARGARIDO
Pages
450-455
DOI
10.4028/www.scientific.net/MSF.636-637.450
Citation
M. Selmi, F. Chaabouni, I. B. Mbarek, M. Abaab, B. Rezig, "Effect of Annealing on the Optical and Structural Properties of TiO2 RF Sputtered Thin Films", Materials Science Forum, Vols. 636-637, pp. 450-455, 2010
Online since
January 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Wan Li Zhang, Hong Chuan Jiang, Bin Peng, Wen Xu Zhang, Shi Qing Yang
Abstract:In this paper, the influences of annealing temperature on TbFe magnetostrictive film magnetic and magnetostrictive characteristics were...
3741
Authors: Ryusuke Nakamura, Takehiro Shudo, Akihiko Hirata, Manabu Ishimaru, Hideo Nakajima
Abstract:Formation behavior of nanovoids during the annealing of amorphous Al2O3 and WO3 was studied by transmission...
541
Authors: Jian Sheng Xie, Ping Luan, Jin Hua Li
Chapter 9: Composite Materials II
Abstract:Using magnetron sputtering technology, the CuInSi nanocomposite thin films were prepared by multilayer synthesized method. The structure of...
2770
Authors: Ching Fang Tseng, Yun Pin Lu, Hsin Han Tung, Pai Chuan Yang
Chapter 3: Electrical, Magnetic and Optical Ceramics
Abstract:This paper describes physical properties of (Ca0.8Sr0.2)TiO3 were deposited by sol-gel method with a fix per-heating temperature of 400oC for...
1171
Authors: S.A. Aly
Abstract:A Vanadium Pentoxide Sample with a Film Thickness of 75 Nm Has Been Thermally Evaporated on Unheated Glass Substrate Using...
139