Paper Title:
Ceramic Target Materials for Sputtering Applications
  Abstract

The lecture will give an overview of the manufacturing technique of ceramic target materials based on ZnO and TiO2. Sintering and plasma spraying techniques are typically used. Also special bonding procedures have to be established in order to join ceramic target materials to metallic carriers. Metallic and ceramic target materials will be compared with respect to target materials processing and sputtering experiences as well. In addition planar and cylindrical targets will be briefly discussed as sputtering of large substrates is strongly moving towards cylindrical cathode applications.

  Info
Periodical
Materials Science Forum (Volumes 638-642)
Main Theme
Edited by
T. Chandra, N. Wanderka, W. Reimers , M. Ionescu
Pages
805-811
DOI
10.4028/www.scientific.net/MSF.638-642.805
Citation
C. Simons, A. Kastner, G. Kiriakidis, "Ceramic Target Materials for Sputtering Applications", Materials Science Forum, Vols. 638-642, pp. 805-811, 2010
Online since
January 2010
Export
Price
$32.00
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