Paper Title:
Structural and Morphological Properties of HfxZr1-xO2 Thin Films Prepared by Pechini Route
  Abstract

In this study, HfxZr1-xO2 (0 < x < 1) thin films were deposited on silicon wafers using a dip-coating technique and by using a precursor solution prepared by the Pechini route. The effects of annealing temperature on the structure and morphological properties of the proposed films were investigated. HfxZr1-xO2 thin films with 1, 3 and 5 layers were annealed in air for 2 h at 600 and 800 °C and the structural and morphological properties studied by X-ray diffraction (XRD) and scanning electron microscopy (SEM). XRD results show that the films have monoclinic and tetragonal structure depending of the Hf and Zr concentration. SEM photographs show that all films consist of nanocrystalline grains with sizes in the range of 6 - 13 nm. The total film thickness is about 90 nm.

  Info
Periodical
Edited by
Arturo Ponce and Darío Bueno
Pages
113-116
DOI
10.4028/www.scientific.net/MSF.644.113
Citation
L.A. García-Cerda, B. A. Puente Urbina, M.A. Quevedo-López, B.E. Gnade, L. A. Baldenegro-Perez, H. N. Alshareef, M. A. Hernández-Landaverde, "Structural and Morphological Properties of HfxZr1-xO2 Thin Films Prepared by Pechini Route", Materials Science Forum, Vol. 644, pp. 113-116, 2010
Online since
March 2010
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