Paper Title:
Characterization of Vanadium Doped 4H- and 6H-SiC Grown by PVT Method Using the Open Seed Backside
  Abstract

Results of vanadium doping in PVT SiC bulk growth by the use of the seeding technique with an open seed backside are shown. Structural and electrical properties of 4H and 6H-SiC:V were investigated by a variety of experimental methods. In the crystal studied, the solubility limit of V in SiC was exceeded and structural defects consisting of V-rich precipitates occured. Electrical properties of this crystal were determined by the V3+/V4+ acceptor level. The V3+ charge state of vanadium was formed by compensating shallow donors (mainly nitrogen) and for both 4H and 6H polytypes it was detectable in optical absorption (in the near-IR range) and electron paramagnetic resonance.

  Info
Periodical
Materials Science Forum (Volumes 645-648)
Edited by
Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller
Pages
21-24
DOI
10.4028/www.scientific.net/MSF.645-648.21
Citation
K. Racka, E. Tymicki, K. Grasza, M. Raczkiewicz, R. Jakieła, M. Kozubal, E. Jurkiewicz-Wegner, A. Brzozowski, R. Diduszko, M. Piersa, K. Kościewicz, M. Pawłowski, J. Krupka, "Characterization of Vanadium Doped 4H- and 6H-SiC Grown by PVT Method Using the Open Seed Backside", Materials Science Forum, Vols. 645-648, pp. 21-24, 2010
Online since
April 2010
Keywords
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