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Observation of Lattice Plane Bending during SiC PVT Bulk Growth Using In Situ High Energy X-Ray Diffraction

Journal Materials Science Forum (Volumes 645 - 648)
Volume Silicon Carbide and Related Materials 2009
Edited by Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller
Pages 29-32
DOI 10.4028/www.scientific.net/MSF.645-648.29
Citation Rainer Hock et al., 2010, Materials Science Forum, 645-648, 29
Online since April, 2010
Authors Rainer Hock, Katja Konias, L. Perdicaro, Andreas Magerl, Philip Hens, Peter J. Wellmann
Keywords Bulk Crystal Growth, PVT Growth
Abstract

We have investigated thermally induced strain in the SiC crystal lattice during physical vapor transport bulk growth. Using high energy x-ray diffraction lattice plane bending was observed in-situ during growth. With increasing growth rate increasing lattice plane bending and, hence, strain was observed. A comparison with numerical modeling of the growth process shows that the latter is related to the heat of crystallization which needs to be dissipated from the crystal growth front. The related temperature gradient as driving force for the dissipation of the heat of crystallization causes lattice plane bending. Optimization of the growth process needs to consider such effects.

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