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Heavily p-Type Doping of Bulk 6H-SiC and 3C-SiC Grown from Al-Si Melts

Journal Materials Science Forum (Volumes 645 - 648)
Volume Silicon Carbide and Related Materials 2009
Edited by Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller
Pages 59-62
DOI 10.4028/www.scientific.net/MSF.645-648.59
Citation Frédéric Mercier et al., 2010, Materials Science Forum, 645-648, 59
Online since April, 2010
Authors Frédéric Mercier, Irina G. Galben-Sandulache, Maya Marinova, Georgios Zoulis, Thierry Ouisse, Efstathios K. Polychroniadis, Didier Chaussende
Keywords Liquid Phase Epitaxy (LPE), Raman Spectroscopy, TEM
Abstract

We report in this work, the solution growth of heavily p-type doped 3C-SiC and 6H-SiC. Description of the 3C and 6H-SiC crystals in terms of defects and resistivity are presented and discussed with respect to growth conditions such as temperature, Al content in the melt and seed polarity. Crystals and thick layers are investigated by means of TEM, NDIC microscopy and Raman.

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