Paper Title:
Comparative Study of Ohmic Contact Metallizations to Nanocrystalline Diamond Films
  Abstract

Nanocrystalline diamond (NCD) films were deposited using plasma-enhanced chemical vapor deposition. The NCD films were Boron-doped for p-type conductivity, yielding sheet resistances from 6.17x1011 to 522.5 /. Four different metals were deposited as Ohmic contacts and investigated for contact resistance and thermal stability. Contact and film annealing was performed under different atmospheric conditions with variable N2 content.

  Info
Periodical
Materials Science Forum (Volumes 645-648)
Edited by
Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller
Pages
733-735
DOI
10.4028/www.scientific.net/MSF.645-648.733
Citation
M. J. Tadjer, T. J. Anderson, K. D. Hobart, T. I. Feygelson, J. E. Butler, F. J. Kub, "Comparative Study of Ohmic Contact Metallizations to Nanocrystalline Diamond Films", Materials Science Forum, Vols. 645-648, pp. 733-735, 2010
Online since
April 2010
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Price
$32.00
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