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Growth and Characterization of Large-Diameter 4H-SiC Crystals with High Crystal Quality

Journal Materials Science Forum (Volumes 645 - 648)
Volume Silicon Carbide and Related Materials 2009
Edited by Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller
Pages 9-12
DOI 10.4028/www.scientific.net/MSF.645-648.9
Citation Masashi Nakabayashi et al., 2010, Materials Science Forum, 645-648, 9
Online since April, 2010
Authors Masashi Nakabayashi, Tatsuo Fujimoto, Masakazu Katsuno, Hiroshi Tsuge, Takashi Aigo, S. Satoh, Hirokatsu Yashiro, Taizo Hoshino, Hosei Hirano, Wataru Ohashi
Keywords A-Face, Large Area Substrates, Photoluminescence (PL), Stacking Fault
Abstract

In-grown type stacking faults (SFs) like structures were observed in 100mm diameter 4H-SiC crystals by Photoluminescence (PL) mappings, and structural analyses using HRTEM clarified that the SF-like structures were comprised of 6H (3, 3) stacking sequences. The stacking sequences of the SF-like structures observed are different from the SFs formed in the a-face grown crystals, suggesting that it is due to 6H nucleation on {0001} plane terraces.

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