Magneto-Transport in Stressed Si:B in the Localization Regime |
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| Journal | Materials Science Forum (Volumes 65 - 66) |
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| Volume | Shallow Impurities in Semiconductors IV |
| Edited by | Gordon Davies |
| Pages | 241-246 |
| DOI | 10.4028/www.scientific.net/MSF.65-66.241 |
| Citation | M. Stöhr et al., 1991, Materials Science Forum, 65-66, 241 |
| Authors | M. Stöhr, P. Janiszewski, J.A. Chroboczek |
| Full Paper | 
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