Paper Title:
A New Technology of Boron Diffusion into Silicon by Rapid Thermal Processing
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 65-66)
Edited by
Gordon Davies
Pages
29-34
DOI
10.4028/www.scientific.net/MSF.65-66.29
Citation
W. Q. Shi, Q. R. Hou, S. X. Liu, X. J. Liu, Z. Q. Fu, Z. J. He, L.W. Lu, "A New Technology of Boron Diffusion into Silicon by Rapid Thermal Processing", Materials Science Forum, Vols. 65-66, pp. 29-34, 1991
Online since
January 1991
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Price
$32.00
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