A New Technology of Boron Diffusion into Silicon by Rapid Thermal Processing |
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| Journal | Materials Science Forum (Volumes 65 - 66) |
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| Volume | Shallow Impurities in Semiconductors IV |
| Edited by | Gordon Davies |
| Pages | 29-34 |
| DOI | 10.4028/www.scientific.net/MSF.65-66.29 |
| Citation | Wan Quan Shi et al., 1991, Materials Science Forum, 65-66, 29 |
| Authors | Wan Quan Shi, Qing Run Hou, Shi Xiang Liu, Xue Jun Liu, Zheng Qing Fu, Zhi Jing He, L.W. Lu |
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