Paper Title:
Thermodynamic Study of Annealing Process of Si-Implanted GaAs
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 65-66)
Edited by
Gordon Davies
Pages
421-426
DOI
10.4028/www.scientific.net/MSF.65-66.421
Citation
M. Ichimura, T. Wada, A. Ito, A. Usami, "Thermodynamic Study of Annealing Process of Si-Implanted GaAs", Materials Science Forum, Vols. 65-66, pp. 421-426, 1991
Online since
January 1991
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Price
$32.00
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