Paper Title:
Preparation and Microstructure Analysis of Ti-Al Sheet by Electron Beam Physical Vapor Deposition
  Abstract

By using electron beam physical vapor deposition (EB-PVD) technology, Ti-Al thin sheet with dimension of 450mm×450mm×0.2mm was prepared and the microstructure of Ti-Al deposit was investigated by means of scanning electron microscopy (SEM), atom force microscopy (AFM) and X-ray diffraction (XRD), and then the effect on deposit by re-evaporation of Al was explored by calculating the ratio of re-evaporating capacity with depositing capacity of Al on the substrate. The results indicate that there existed equiaxed crystal and columnar crystal along the cross-sectional may resulted from the transformation latent heats released during the transition course of atoms from gaseous state to solid state, and the variation of target-substrate distance would take effect on the phase composition due to the changing of atoms collision probability and radiant heat quantity absorbed by substrate. The effect on deposit by re-evaporation of Al could be neglected because the re-evaporating capacity of Al was far below that of the depositing capacity.

  Info
Periodical
Edited by
Yafang Han, Tianmin Wang and Shaoxiong Zhou
Pages
302-307
DOI
10.4028/www.scientific.net/MSF.650.302
Citation
Y. J. Zhao, L. Ma, X. D. He, "Preparation and Microstructure Analysis of Ti-Al Sheet by Electron Beam Physical Vapor Deposition", Materials Science Forum, Vol. 650, pp. 302-307, 2010
Online since
May 2010
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Price
$32.00
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