Paper Title:
Amorphous and nc-Si:H Intrinsic Thin Films for Solar Cells Applications
  Abstract

This contribution discusses the deposition process and properties of intrinsic silicon thin films processed by the hot wire chemical vapour deposition technique. We review some fundamental characterization techniques that are used to probe into the quality of the material and thus decide its susceptibility to be used as the intrinsic layer in solar cells industry. This paper covers the optical, structural and electrical properties of the material. Results from UV-visible and IR spectroscopy, XRD and Raman scattering, X-section TEM as well as dark and photo-currents are given. It is shown that the thermal activation energy is a good measure of the quality of the sample.

  Info
Periodical
Edited by
Amir Al-Ahmed
Pages
191-207
DOI
10.4028/www.scientific.net/MSF.657.191
Citation
S. Halindintwali, D. Knoesen, B. A. Julies, T. Muller, C. J. Arendse, "Amorphous and nc-Si:H Intrinsic Thin Films for Solar Cells Applications", Materials Science Forum, Vol. 657, pp. 191-207, 2010
Online since
July 2010
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