Paper Title:
Effect of Various CF4/CH4 Flow Ratios on Structure and Optical Band Gap of Fluorinated Diamond-Like Carbon Thin Films
  Abstract

Fluorinated diamond-like carbon (F-DLC) thin films are deposited using radio frequency plasma enhanced chemical vapor deposition under various gas flow ratios. The surface morphology of the F-DLC thin films deposited at lower gas flow ratios is a compact and uniform structure, and it became rough with the increase of gas flow ratios. The relative atomic contents of fluorine and chemical bonding configurations of C-Fx (x=1, 2, 3) in the thin films increases with the increase of gas flow ratios. The optical band gap of the thin films presents a decrease of different degree with the increase of gas flow ratios.

  Info
Periodical
Materials Science Forum (Volumes 663-665)
Edited by
Yuan Ming Huang
Pages
312-315
DOI
10.4028/www.scientific.net/MSF.663-665.312
Citation
J. R. Xiao, T. Tong, Y. W. Li, X. H. Li, "Effect of Various CF4/CH4 Flow Ratios on Structure and Optical Band Gap of Fluorinated Diamond-Like Carbon Thin Films", Materials Science Forum, Vols. 663-665, pp. 312-315, 2011
Online since
November 2010
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$32.00
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