TiO2 thin films were deposited from Ti2¬O3, TiO2 and Ti3O5 source materials by e-beam. The refractive index and extinction coefficient of the films in the visible and near infrared（IR） region were measured. The structural and chemical properties of the films were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS). XRD measurements revealed that all the deposited films were amorphous. XPS analysis showed the films were stoichiometric TiO2. The AFM investigation confirmed that the surface roughness of the films was dependent on the deposition conditions.