Internal Stress and Grain Size Effect on the Phase Stabilization of ZrO2 Deposited by MOCVD

Ji, Vincent; Ma, Sheng Li; Wang, Bin; Chen, Zhe; Prud’homme, Nathalie; Ribot, Patrick

Get full access here Site/IP Subscriptions Log in

My Cart

Advanced Search

Paper Titles

Effects of Curing Method on the Gas Separation Performance of Phenolic Resin/Poly(vinyl Alcohol)-Based Carbon Membrane Materials, p.1185
Preparation and Characteristics of Integral Water Repellent Cement-Based Materials, p.1189
Effect of Negative Pulse Voltage on the Microstructure and Corrosion Resistance of Microarc Oxidation Film of A356 Aluminum Alloy, p.1193
Preparation and Properties of the Organic-Inorganic Composite Coating on Aluminum Alloy, p.1197
Internal Stress and Grain Size Effect on the Phase Stabilization of ZrO₂ Deposited by MOCVD, p.1201
Enhanced Surface Properties Induced by High Current Pulsed Electron Beam (HCPEB) Treatment, p.1205
Influence of Al₂O₃ Buffer Layers on the Properties of Indium–Tin Oxide Films on PET Substrate by RF-Magnetron Sputtering, p.1209
The Fabrication of W-Cu Modified Layers on the Surface of the Continuous Casting Machine Mould Copper Plate by Infiltration, p.1213
A Method for Ultrasonic Characterization of Density, Thickness and Velocity of Homogeneous Coating, p.1217

Home > Materials Science Forum > Advanced Material Science and Technology > Internal Stress and Grain Size Effect on the Phase...

Paper Title:

Internal Stress and Grain Size Effect on the Phase Stabilization of ZrO₂ Deposited by MOCVD

Periodical	Materials Science Forum (Volumes 675 - 677)
Main Theme	Advanced Material Science and Technology
Edited by	Yi Tan and Dongying Ju
Pages	1201-1204
DOI	10.4028/www.scientific.net/MSF.675-677.1201
Citation	Zhe Chen et al., 2011, Materials Science Forum, 675-677, 1201
Online since	February, 2011
Authors	Zhe Chen, Bin Wang, Nathalie Prud’homme, Sheng Li Ma, Vincent Ji, Patrick Ribot
Keywords	Annealing, MOCVD, Phase Transformation, Tetragonal Phase, Thin Film, Zro₂
Price	US$ 28,-

View full size

Abstract

Zirconia (ZrO2) films were deposited by metal-organic chemical vapor deposition (MOCVD) on {1 0 0} Si single crystal using Zr(thd)4 precursors. The thickness of obtained films is typically of 3.5 μm. The samples have been characterized by Field-Emission-Gun Scanning Electron Microscopy (FEG-SEM) for morphologic and microstructure study, and by X-ray Diffraction (XRD) for crystalline structure. The microstructure analysis showed that unexpected stable single tetragonal phase preferentially grew in low temperature area. According to the literature, the tetragonal phase stabilization is related to the crystalline size and the internal compressive stress. To analyze the effect of grain size and internal stress on the phase transformation, the thermal annealing were carried out in different temperatures and internal stress was measured by XRD method.