Paper Title:
Temperature Field Simulation of Nitride Hard Film Irradiated by High-Intensity Pulsed Ion Beam
  Abstract

Surface treatment of hard nitride film with high-intensity pulsed ion beam (HIPIB) was investigated in the present research. On considering the high energy density and short pulse duration of HIPIB source, a one-dimension physical model was built according to the structure feature of film-base sample. It was found that the irradiation of HIPIB lead to a very fast thermal recycle of heating rate 1011K/s and cooling rate up to 1010K/s. The highest temperature located at the surface of film irradiated. When using the HIPIB parameters of accelerating voltage 350kV, pulse duration 70ns and current density 60A/cm2, the surface layer of film would be melt with depth of about 0.35mm, that was verified by the experimental result along with the grain refinement effect due to the fast solidification process.

  Info
Periodical
Materials Science Forum (Volumes 675-677)
Edited by
Yi Tan and Dongying Ju
Pages
521-524
DOI
10.4028/www.scientific.net/MSF.675-677.521
Citation
J. Chen, J. Xing, L. Lin, S. Z. Hao, M.K. Lei, "Temperature Field Simulation of Nitride Hard Film Irradiated by High-Intensity Pulsed Ion Beam", Materials Science Forum, Vols. 675-677, pp. 521-524, 2011
Online since
February 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Tae Ho Shin, Ji Heang Yu, Shi Woo Lee, In Sub Han, Doo Won Seo, Ki Seok Hong, Sang Kuk Woo, Sang Hoon Hyun
1114
Authors: Shiuh Chuan Her, Yi Hsia Wang
Abstract:Silver films were prepared on the glass substrate by electron-beam vapor deposition. The reflectivity of the Ag thin film was measured by a...
1412
Authors: Yi Jin Ren
Chapter 5: Metal-Matrix Composites
Abstract:The glass transition temperaure Tg of amorphous polymer thin film was investigated. The opposite experimental results, the increase or...
1457
Authors: You Yi Zheng, Chun Lin Zhang, Xing Xin Xu
Chapter 3: Materials Science
Abstract:The diamond thin films was deposited by hot filament CVD method in the Cemented Carbide (YG6) substrate. The surface morphology and quality...
589
Authors: Wu Tang, Ji Jun Yang, Chi Ming Li
Chapter 2: Materials Science and Processing
Abstract:In this paper, Al2O3 thin film samples were deposited on Si-(100) substrate by electron beam evaporation with different thickness at...
161