Paper Title:
Complete Determination of the Local Stress Field in Epitaxial Thin Films Using Single Microstructure
  Abstract

In this article, using finite element simulations and analytical approaches, we demonstrate that planar rotators[1] can be effectively used to determine both the uniform and gradient residual stresses in thin films with higher accuracy compared to other microstructures.

  Info
Periodical
Materials Science Forum (Volumes 679-680)
Edited by
Edouard V. Monakhov, Tamás Hornos and Bengt. G. Svensson
Pages
213-216
DOI
10.4028/www.scientific.net/MSF.679-680.213
Citation
M. Camarda, R. Anzalone, A. Severino, N. Piluso, A. La Magna, F. La Via, "Complete Determination of the Local Stress Field in Epitaxial Thin Films Using Single Microstructure", Materials Science Forum, Vols. 679-680, pp. 213-216, 2011
Online since
March 2011
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