Paper Title:
Comparison between the Piezoresistive Properties of a-SiC Films Obtained by PECVD and Magnetron Sputtering
  Abstract

This work compares the piezoresistive properties of SiC thin films produced by two techniques enhanced by plasma, PECVD (plasma enhanced chemical vapor deposition) and RF magnetron sputtering. In order to study these properties, strain gauges based on SiC films produced were fabricated using photolithography techniques in conjunction with lift-off processes. The beam-bending method was used to characterize the SiC strain gauges fabricated.

  Info
Periodical
Materials Science Forum (Volumes 679-680)
Edited by
Edouard V. Monakhov, Tamás Hornos and Bengt. G. Svensson
Pages
217-220
DOI
10.4028/www.scientific.net/MSF.679-680.217
Citation
M. A. Fraga, "Comparison between the Piezoresistive Properties of a-SiC Films Obtained by PECVD and Magnetron Sputtering", Materials Science Forum, Vols. 679-680, pp. 217-220, 2011
Online since
March 2011
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$32.00
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