Paper Title:

Comparison between the Piezoresistive Properties of a-SiC Films Obtained by PECVD and Magnetron Sputtering

Periodical Materials Science Forum (Volumes 679 - 680)
Main Theme Silicon Carbide and Related Materials 2010
Edited by Edouard V. Monakhov, Tamás Hornos and Bengt. G. Svensson
Pages 217-220
DOI 10.4028/www.scientific.net/MSF.679-680.217
Citation Mariana A. Fraga, 2011, Materials Science Forum, 679-680, 217
Online since March, 2011
Authors Mariana A. Fraga
Keywords Gauge Factor, PECVD, Piezoresistive Property, RF Magnetron Sputtering, Silicon Carbide (SiC)
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Abstract

This work compares the piezoresistive properties of SiC thin films produced by two techniques enhanced by plasma, PECVD (plasma enhanced chemical vapor deposition) and RF magnetron sputtering. In order to study these properties, strain gauges based on SiC films produced were fabricated using photolithography techniques in conjunction with lift-off processes. The beam-bending method was used to characterize the SiC strain gauges fabricated.