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Thermally-Assisted Tunneling Model for 3C-SiC p+-n Diodes

Journal Materials Science Forum (Volumes 679 - 680)
Volume Silicon Carbide and Related Materials 2010
Edited by Edouard V. Monakhov, Tamás Hornos and Bengt. G. Svensson
Pages 571-574
DOI 10.4028/www.scientific.net/MSF.679-680.571
Citation Bernd Zippelius et al., 2011, Materials Science Forum, 679-680, 571
Online since March, 2011
Authors Bernd Zippelius, Michael Krieger, Heiko B. Weber, Gerhard Pensl, Hiroyuki Nagasawa, Takamitsu Kawahara, Naoki Hatta, Kuniaki Yagi, Hidetsugu Uchida, Motoki Kobayashi
Keywords Leakage Current, p+n Diodes, Thermal Barrier Height, Thermally-Assisted Tunneling
Abstract

The dependence of the reverse current of 3C-SiC p+-n diodes on the temperature and on the reverse bias is measured and a model based on thermally-assisted tunneling is proposed to explain the dominating mechanism responsible for the leakage current. Taking into account an additional ohmic shunt resistance, the experimental reverse characteristics and thermal barrier heights B can sufficiently be reproduced.

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