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Stress Analysis by Kossel Microdiffraction on a Nickel-Based Single Crystal Superalloy during an In Situ Tensile Test – Comparison with Classical X-Ray Diffraction

Journal Materials Science Forum (Volume 681)
Volume Residual Stresses VIII
Edited by Paolo Scardi and Cristy L. Azanza Ricardo
Pages 1-6
DOI 10.4028/www.scientific.net/MSF.681.1
Citation Denis Bouscaud et al., 2011, Materials Science Forum, 681, 1
Online since March, 2011
Authors Denis Bouscaud, Raphaël Pesci, Sophie Berveiller, Etienne Patoor
Keywords In Situ, Kossel Microdiffraction, Scanning Electron Microscope (SEM), Synchrotron Radiation
Abstract

A Kossel microdiffraction experimental set up is under development inside a Scanning Electron Microscope (SEM) in order to determine the crystallographic orientation as well as the inter- and intragranular strains and stresses. An area of about one cubic micrometer can be analysed using the microscope probe, which enables to study different kinds of elements such as a grain boundary, a crack, a microelectronic component, etc. The diffraction pattern is recorded by a high resolution Charge-Coupled Device (CCD) camera. The crystallographic orientation, the lattice parameters and the elastic strain tensor of the probed area are deduced from the pattern indexation using a homemade software. The purpose of this paper is to report some results achieved up to now to estimate the reliability of the Kossel microdiffraction technique.

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