Paper Title:
A Simple Texturization Approach for Mono-Crystalline Silicon Solar Cell with Low TMAH Concentration Solution
  Abstract

Texturing for mono-crystalline silicon solar cell by chemical anisotropic etching is one of the most important techniques in photovoltaic industry. In recent years, tetramethylammonium hydroxide (TMAH) solution or a mixture of TMAH solution with IPA was reported to be used for random pyramids texturization on silicon surface due to its non-volatile, nontoxic, good anisotropic etching characteristics and uncontaminated metal ions. However, most of the studies were reported about the etching processes by using high TMAH concentration solutions. In this study, a simple and cost-effective approach for texturing mono-crystalline silicon wafers in low TMAH concentration solutions was proposed. Etching was performed on (100) silicon wafers using silicon-dissolved tetramethylammonium hydroxide (TMAH) solutions (0.5~1 %) without addition of surfactant. The surface phenomena, surface morphology and surface reflectance have been analyzed. A textured surface with smaller and smooth pyramids can be realized by using 1 % silicon-dissolved TMAH solutions.

  Info
Periodical
Edited by
Kunyuan Gao, Shaoxiong Zhou, Xinqing Zhao
Pages
26-30
DOI
10.4028/www.scientific.net/MSF.685.26
Citation
W. Y. Ou, Y. Zhang, H. L. Li, L. Zhao, C. L. Zhou, H. W. Diao, M. Liu, W. M. Lu, J. Zhang, W. J. Wang, "A Simple Texturization Approach for Mono-Crystalline Silicon Solar Cell with Low TMAH Concentration Solution", Materials Science Forum, Vol. 685, pp. 26-30, 2011
Online since
June 2011
Keywords
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