Paper Title:
Microstructure and Properties of TiAlN Compound Films Fabricated on AZ91D Alloy by Magnetron Sputtering
  Abstract

By means of reaction magnetron sputtering, TiAlN ternary compound films were deposited on AZ91D magnesium alloy substrates. The influence of partial pressure ratio of N2 to Ar (N2/Ar) on the microstructure and properties of TiAlN film was explored with scanning electron microscopy (SEM), X-ray diffraction (XRD), and tests of microhardness, hydrophile and corrosion resistance. The results show that with the increase of N2/Ar partial pressure ratio from 0.5:10 to 1.5:10, Ti2N becomes the main film phase and the size of the crystals cluster decreases. As the N2/Ar ratio is as higher as 2:10, the film crystals change from Ti2N to TiN with coarse clusters. With increase of N2/Ar rate, the hardness, hydrophobic nature and corrosion resistance of the TiAlN film tend to increase.

  Info
Periodical
Edited by
Yafang Han, Fusheng Pan, Jianmao Tang, Chungen Zhou
Pages
589-594
DOI
10.4028/www.scientific.net/MSF.686.589
Citation
S. Lu, L. W. Wu, J. Chen, "Microstructure and Properties of TiAlN Compound Films Fabricated on AZ91D Alloy by Magnetron Sputtering", Materials Science Forum, Vol. 686, pp. 589-594, 2011
Online since
June 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Qing Quan Xiao, Quan Xie, Ke Jie Zhao, Zhi Qiang Yu
Abstract:Semiconducting Mg2Si films were fabricated on Si (111) substrates by magnetron sputtering and subsequent annealing, and the effects of...
166
Authors: Yin Qun Hua, Jie Yu, Rui Fang Chen, Cheng Chen, Rui Li Xu
Abstract:Nanocrystalline ZnS thin films are prepared on glass substrates under various deposition conditions (radio frequency power, and sputtering...
2259
Authors: Chang Wei Zou, Jun Zhang, Wei Xie, Le Xi Shao
Abstract:CrN films with deposition rates of 30-190 nm/min were deposited on Si (111) substrates by middle-frequency magnetron sputtering methods. XRD,...
901
Authors: Xiang Rong Zhu, Nai Ci Bing, Zhong Ling Wei, Qiu Rong Chen
Surface Engineering/Coatings
Abstract:TiN films were deposited on the AZ 31 magnesium alloy substrates by d.c. magnetron sputtering technique. The surface properties of the films...
53
Authors: Fei Xiong Mao, Tao Liu, Shi Wei Liu, Jing Kun Yu
Chapter 16: Sustainable Manufacturing Technologies
Abstract:Mg films were prepared by magnetron sputtering on zirconia substrate. The surface morphology, structure and adhesion performance were...
2834