Paper Title:
In Situ X-Ray Reflectivity Study of Imprint in Ferroelectric Thin Films
  Abstract

The structural origin of imprint in Pb(Zr,Ti)O3 (PZT) ferroelectric thin films derived by chemical solution deposition with Pt top and bottom electrodes was studied by in-situ high-resolution X-ray specular reflectivity of synchrotron radiation. Global structural parameters of density, thickness, and surface or interface roughness of each component layer in the thin film sample were obtained. No generation of interfacial layers with a different electron density from PZT and no interface roughening were observed at the interfaces of PZT and Pt during imprint. Thus, the results suggest that the imprint effect is more likely a bulk or electronic defects-related phenomenon.

  Info
Periodical
Edited by
Chengming Li, Chengbao Jiang, Zhiyong Zhong and Yichun Zhou
Pages
292-296
DOI
10.4028/www.scientific.net/MSF.687.292
Citation
J. L. Cao, K. Zhang, A. Solbach, Z. X. Yue, H. H. Wang, Y. Chen, U. Klemradt, "In Situ X-Ray Reflectivity Study of Imprint in Ferroelectric Thin Films", Materials Science Forum, Vol. 687, pp. 292-296, 2011
Online since
June 2011
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