Paper Title:
Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering
  Abstract

Copper nitride thin films were deposited on glass substrates by reactive DC magnetron sputtering at various N2-gas flow rates and different substrate temperature. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3 structure and exhibit preferential orientation to the [111] and [100]. The preferred crystalline orientation of the films changes with the N2-gas flow rate and substrate temperature. The N2-gas flow rate and the substrate temperature not only affect the crystal structure of films but also affect the deposition rate, the resistivity and the microhardness of the Cu3N films.

  Info
Periodical
Edited by
Chengming Li, Chengbao Jiang, Zhiyong Zhong and Yichun Zhou
Pages
706-710
DOI
10.4028/www.scientific.net/MSF.687.706
Citation
X. A. Li, J. P. Yang, Y. T. Li, L. X. Wang, H. Y. Wang, "Study on Copper Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering", Materials Science Forum, Vol. 687, pp. 706-710, 2011
Online since
June 2011
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