Paper Title:
Compromising Effect on Development of Recrystallization Texture in Aluminium Sheet – A 2D MC Type Simulation –
  Abstract

The migration rates of C->Si, Si->C, and Si->Sj were assumed to be high and those of Si->Si and all other rates to be low. Here Si(i=1,2,3,4) is a variant of S orientation and C->Si means the growth of a cube grain into an Si grain. The textural development through grain coarsening was simulated as a function of the ratio of the high rate to the low one. The compromising effect surely promotes the development of the cube texture but its decisive development requires any asymmetry between C->Si and Si->C migration processes.

  Info
Periodical
Materials Science Forum (Volumes 702-703)
Chapter
Chapter 5: Annealing
Edited by
Asim Tewari, Satyam Suwas, Dinesh Srivastava, Indradev Samajdar and Arunansu Haldar
Pages
655-658
DOI
10.4028/www.scientific.net/MSF.702-703.655
Citation
K. Ito, "Compromising Effect on Development of Recrystallization Texture in Aluminium Sheet – A 2D MC Type Simulation –", Materials Science Forum, Vols. 702-703, pp. 655-658, 2012
Online since
December 2011
Authors
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Price
$32.00
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