Paper Title:
Oxygen Behavior during Silicon Epitaxial Growth: Recent Advances
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 83-87)
Edited by
Gordon Davies, G.G. DeLeo and M. Stavola
Pages
1069-1074
DOI
10.4028/www.scientific.net/MSF.83-87.1069
Citation
B. Pivac, A. Borghesi, M. Geddo, A. Sassella, A. Stella, "Oxygen Behavior during Silicon Epitaxial Growth: Recent Advances", Materials Science Forum, Vols. 83-87, pp. 1069-1074, 1992
Online since
January 1992
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Price
$32.00
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