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An Isothermal Pumping Mechanism for the Introduction of High Hydrogen Concentrations in p+ Layers in Silicon

Journal Materials Science Forum (Volumes 83 - 87)
Volume Defects in Semiconductors 16
Edited by Gordon Davies, G.G. DeLeo and M. Stavola
Pages 39-44
DOI 10.4028/www.scientific.net/MSF.83-87.39
Citation A.D. Marwick et al., 1992, Materials Science Forum, 83-87, 39
Authors A.D. Marwick, M. Wittmer, G.S. Oehrlein
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