Paper Title:
Pressure Dependence of Formation and Migration Enthalpies for Atomic Diffusion in Si: Conjugate Gradient Minimization of Total Energy
  Abstract

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Periodical
Materials Science Forum (Volumes 83-87)
Edited by
Gordon Davies, G.G. DeLeo and M. Stavola
Pages
469-474
DOI
10.4028/www.scientific.net/MSF.83-87.469
Citation
O. Sugino, A. Oshiyama, "Pressure Dependence of Formation and Migration Enthalpies for Atomic Diffusion in Si: Conjugate Gradient Minimization of Total Energy", Materials Science Forum, Vols. 83-87, pp. 469-474, 1992
Online since
January 1992
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