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Measurements of the Diffusion Coefficient of Hydrogen in Silicon Monitored by Catalyzed Enhanced Oxygen Diffusion Jumps

Journal Materials Science Forum (Volumes 83 - 87)
Volume Defects in Semiconductors 16
Edited by Gordon Davies, G.G. DeLeo and M. Stavola
Pages 87-92
DOI 10.4028/www.scientific.net/MSF.83-87.87
Citation R.C. Newman et al., 1992, Materials Science Forum, 83-87, 87
Authors R.C. Newman, J.H. Tucker, S.A. McQuaid
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