Paper Title:
HVEM In Situ Investigation of Stress-Induced Grain Growth during Thermal Annealing of Thin Al-Alloy Films on a Si/SiO2 Substrate
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Periodical
Materials Science Forum (Volumes 94-96)
Edited by
G. Abbruzzese and P. Brozzo
Pages
551-556
DOI
10.4028/www.scientific.net/MSF.94-96.551
Citation
D. Katzer, D. Gerth, R. Riesenberg, "HVEM In Situ Investigation of Stress-Induced Grain Growth during Thermal Annealing of Thin Al-Alloy Films on a Si/SiO2 Substrate ", Materials Science Forum, Vols. 94-96, pp. 551-556, 1992
Online since
January 1992
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