Papers by keyword «Reactive Ion Etching»
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Mechanism of Reactive Ion Etching of 6H-SiC in CHF3/O2 Gas Mixtures
Authors: N. Sieber, Jürgen Ristein, Lothar Ley
Keywords: Etching Model, Reactive Ion Etching, Surface Chemistry
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Fast and Anisotropic Reactive Ion Etching of 4H and 6H SiC in NF3
Authors: V. Saxena, A.J. Steckl
Keywords: Anisotropy, Etch Rate, NF3, Reactive Ion Etching, Roughness
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6H-SiC Schottky Diode Edge Terminated Using Amorphous SiC by Sputtering Method
Authors: K. Matsumoto, Y. Chen, J. Kuzmik, Shigehiro Nishino
Keywords: Edge Termination, Reactive Ion Etching, Schottky, Sputtering
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Nanometre Scale Reactive Ion Etching of GaN Epilayers
Authors: D. Coquillat, S.K. Murad, A. Ribayrol, C.J.M. Smith, R.M. De La Rue, Chris D.W. Wilkinson, O. Briot, R.L. Aulombard
Keywords: CH4, CHF3, Galium Nitride (GaN), PMMA, Reactive Ion Etching, SiCl4, SiNx, Titanium
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Fermi Level Pinning and Schottky Barrier Characteristics on Reactively Ion Etched 4H-SiC
Authors: B.J. Skromme, E. Luckowski, K. Moore, S. Clemens, D. Resnick, T. Gehoski, D. Ganser
Keywords: Annealing, Barrier Height, Fermi Level Pinning, Ideality, Leakage Current, Nickel Ni, Platinum, Reactive Ion Etching, Schottky Barrier, Titanium
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Reactive Ion Etching in CF4 / O2 Gas Mixtures for Fabricating SiC Devices
Authors: Masayuki Imaizumi, Yoichiro Tarui, Hiroshi Sugimoto, J. Tanimura, Tetsuya Takami, Tatsuo Ozeki
Keywords: Accumulation Mode, MOSFET, Reactive Ion Etching, RIE Rate, Surface Roughness, X-Ray Photoelectron Spectroscopy (XPS)
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Preliminary Investigation of SiC on Silicon for Biomedical Applications
Authors: G.E. Carter, Jeff B. Casady, J. Bonds, M.E. Okhuysen, James D. Scofield, S.E. Saddow
Keywords: 3C, Biomedical Probe, MEMS, Microelectromechanical, Reactive Ion Etching, RIE, SF6
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Effect of Plasma Etching and Sacrificial Oxidation on 4H-SiC Schottky Barrier Diodes
Authors: D.J. Morrison, A.J. Pidduck, V. Moore, P.J. Wilding, Keith P. Hilton, Michael J. Uren, C. Mark Johnson
Keywords: Electrical Characterisation, Reactive Ion Etching, Sacrificial Oxidation, Schottky Barrier Diode, X-Ray Photoelectron Spectroscopy (XPS)
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Process-Induced Defects and Optical Memory in Gallium Nitride
Authors: R. Cheung, R.J. Reeves, S.A. Brown
Keywords: Photoluminescence (PL), Processing, Reactive Ion Etching
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A Novel Technique for Shallow Angle Beveling of SiC to Prevent Surface Breakdown in Power Devices
Authors: J. Neil Merrett, David C. Sheridan, John R. Williams, Chin Che Tin, J.D. Cressler
Keywords: Beveling, Edge Termination, Etch Mask, Power Device, Reactive Ion Etching
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