Paper Title:
Formation and Optimization of Shallow Junctions by Ion Implantation and Rapid Thermal Annealing for CMOS Application
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Periodical
Solid State Phenomena (Volumes 1-2)
Edited by
D. Stievenard and J.C. Bourgoin
Pages
159-168
DOI
10.4028/www.scientific.net/SSP.1-2.159
Citation
I. W. Wu, "Formation and Optimization of Shallow Junctions by Ion Implantation and Rapid Thermal Annealing for CMOS Application", Solid State Phenomena, Vols. 1-2, pp. 159-168, 1988
Online since
January 1991
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Price
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