Formation and Optimization of Shallow Junctions by Ion Implantation and Rapid Thermal Annealing for CMOS Application |
|
| Journal | Solid State Phenomena (Volumes 1 - 2) |
|---|---|
| Volume | Ion Implantation in Semiconductors |
| Edited by | D. Stievenard and J.C. Bourgoin |
| Pages | 159-168 |
| DOI | 10.4028/www.scientific.net/SSP.1-2.159 |
| Citation | I Wei Wu, 1991, Solid State Phenomena, 1-2, 159 |
| Authors | I Wei Wu |
| Full Paper | 
Get the full paper by clicking here
|
First page example
