Recoil Implantation for Shallow Junction Formation in Silicon |
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| Journal | Solid State Phenomena (Volumes 1 - 2) |
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| Volume | Ion Implantation in Semiconductors |
| Edited by | D. Stievenard and J.C. Bourgoin |
| Pages | 195-201 |
| DOI | 10.4028/www.scientific.net/SSP.1-2.195 |
| Citation | Harry L. Kwok, 1991, Solid State Phenomena, 1-2, 195 |
| Authors | Harry L. Kwok |
| Full Paper | 
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