Ultra Clean Processing of Silicon Surfaces VII
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High-k Gate Dielectrics on Silicon and Germanium: Impact of Surface Preparation Authors: Alessio Beverina, M.M. Frank, H. Shang, S. Rivillon, F. Amy, C.L. Hsueh, V.K. Paruchuri, R.T. Mo, M. Copel, E.P. Gusev, M.A. Gribelyuk, Y.J. Chabal |
3 |
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UV Activated Surface Preparation of Silicon for High-k Dielectric Deposition Authors: Casey C. Finstad, Anthony Muscat |
7 |
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Enhanced Surface Preparation Techniques for the Si/High-k Interface Authors: Joel Barnett, Chadwin D. Young, Naim Moumen, Gennadi Bersuker, Jeff J. Peterson, George A. Brown, Byoung Hun Lee, Howard R. Huff |
11 |
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Uniform Ultrathin Oxide Growth for High-k Preclean Authors: Jeffery W. Butterbaugh, Steven L. Nelson, Thomas J. Wagener |
15 |
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Authors: Bart Onsia, Matty Caymax, Thierry Conard, Stefan de Gendt, F. De Smedt, A. Delabie, C. Gottschalk, Marc M. Heyns, M. Green, S. Lin, Paul W. Mertens, W. Tsai, Chris Vinckier |
19 |
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Interface State Densities and Surface Charge on Wet-Chemically Prepared Si(100) Surfaces Authors: Heike Angermann |
23 |
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A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface Authors: Bart Onsia, Thierry Conard, Stefan de Gendt, Marc M. Heyns, I. Hoflijk, Paul W. Mertens, Marc Meuris, G. Raskin, Sonja Sioncke, I. Teerlinck, Antoon Theuwis, Jan Van Steenbergen, Chris Vinckier |
27 |
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Surface Preparation Techniques for High-k Deposition on Ge Substrates Authors: Sven Van Elshocht, A. Delabie, B. Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Riikka Puurunen, Olivier Richard, Jan Van Steenbergen, Chao Zhao, Marc Meuris, Marc M. Heyns |
31 |
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Advanced Surface Cleaning Strategy for 65nm CMOS Device Performance Enhancement Authors: F. Arnaud, H. Bernard, Alessio Beverina, R. El-Farhane, B. Duriez, Kathy Barla, Didier Lévy |
37 |
