Etch Rate Depth Profiling by Single Wafer Etching Equipment |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
107-110 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.107 |
| Citation |
Enrico Bellandi et al., 2005, Solid State Phenomena, 103-104, 107 |
| Online since |
April, 2005 |
| Authors |
Enrico Bellandi, Alice C. Elbaz, Rosella Piagge, Francesco Pipia, Mauro Alessandri |
| Keywords |
Etch Rate Profiling, Single Wafer |
| Full Paper |
Get the full paper by clicking here
|
