Novel Chemical Etching to Correct Film Thickness Distributions |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
111-114 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.111 |
| Citation |
Hajime Ugajin et al., 2005, Solid State Phenomena, 103-104, 111 |
| Online since |
April, 2005 |
| Authors |
Hajime Ugajin, Hayato Iwamoto, Kei Kinoshita |
| Keywords |
Correction Etching, High Density Plasma Chemical Vapor Deposition, Uniformity |
| Full Paper |
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