Paper Title:
Etching of Silicon Oxide Films in Supercritical Carbon Dioxide
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
115-120
DOI
10.4028/www.scientific.net/SSP.103-104.115
Citation
K. Saga, H. Kuniyasu, T. Hattori, K. Yamada, T. Azuma, "Etching of Silicon Oxide Films in Supercritical Carbon Dioxide", Solid State Phenomena, Vols. 103-104, pp. 115-120, 2005
Online since
April 2005
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Price
$32.00
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