Uniform Ultrathin Oxide Growth for High-k Preclean |
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| Journal | Solid State Phenomena (Volumes 103 - 104) |
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| Volume | Ultra Clean Processing of Silicon Surfaces VII |
| Edited by | Paul Mertens, Marc Meuris and Marc Heyns |
| Pages | 15-18 |
| DOI | 10.4028/www.scientific.net/SSP.103-104.15 |
| Online since | April, 2005 |
| Authors | Jeffery W. Butterbaugh, Steven L. Nelson, Thomas J. Wagener |
| Keywords | High-k, Oxide Growth, Ozonated Water, Ozone |
| Full Paper | 
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