Paper Title:
Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning
  Abstract

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Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
151-154
DOI
10.4028/www.scientific.net/SSP.103-104.151
Citation
S. Verhaverbeke, R. Gouk, D. Yost, "Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning", Solid State Phenomena, Vols. 103-104, pp. 151-154, 2005
Online since
April 2005
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$32.00
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