Paper Title:
Damage-Free Cleaning of Sub-50 nm Devices Using Directed Megasonics Technology in a Single Wafer Processor
  Abstract

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Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
167-170
DOI
10.4028/www.scientific.net/SSP.103-104.167
Citation
J.J. Rosato, M.R. Yalamanchili, M.J. Beck, R.Y. Lillard, "Damage-Free Cleaning of Sub-50 nm Devices Using Directed Megasonics Technology in a Single Wafer Processor", Solid State Phenomena, Vols. 103-104, pp. 167-170, 2005
Online since
April 2005
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