Non-Damaging Particle Removal Using Cryogenic Aerosols |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
181-184 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.181 |
| Citation |
Thomas J. Wagener et al., 2005, Solid State Phenomena, 103-104, 181 |
| Online since |
April, 2005 |
| Authors |
Thomas J. Wagener, James F. Weygand, Gregory P. Thomes |
| Keywords |
Argon Aerosols, Cryogenic Aerosols, Defect Reduction, Low-k Dielectrics, Nitrogen Aerosols, Non-Damaging, Particle Removal, Poly-Silicon Lines, Yield Enhancement |
| Full Paper |
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