Paper Title:
On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition
  Abstract

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Periodical
Solid State Phenomena (Volumes 103-104)
Edited by
Paul Mertens, Marc Meuris and Marc Heyns
Pages
19-22
DOI
10.4028/www.scientific.net/SSP.103-104.19
Citation
B. Onsia, M. Caymax, T. Conard, S. De Gendt, F. De Smedt, A. Delabie, C. Gottschalk, M. M. Heyns, M. Green, S. Lin, P. W. Mertens, W. Tsai, C. Vinckier, "On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition", Solid State Phenomena, Vols. 103-104, pp. 19-22, 2005
Online since
April 2005
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