On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
19-22 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.19 |
| Online since |
April, 2005 |
| Authors |
Bart Onsia,
Matty Caymax,
Thierry Conard,
Stefan De Gendt,
F. De Smedt,
A. Delabie,
C. Gottschalk,
Marc M. Heyns,
M. Green,
S. Lin,
Paul W. Mertens,
W. Tsai,
Chris Vinckier
|
| Keywords |
Atomic Layer Deposition ALD, High-k, Interface, Oxide, Ozone |
| Full Paper |
Get the full paper by clicking here
|
