On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition |
| Journal |
Solid State Phenomena (Volumes 103 - 104) |
| Volume |
Ultra Clean Processing of Silicon Surfaces VII |
| Edited by |
Paul Mertens, Marc Meuris and Marc Heyns |
| Pages |
19-22 |
| DOI |
10.4028/www.scientific.net/SSP.103-104.19 |
| Citation |
Bart Onsia et al., 2005, Solid State Phenomena, 103-104, 19 |
| Online since |
April, 2005 |
| Authors |
Bart Onsia, Matty Caymax, Thierry Conard, Stefan De Gendt, F. De Smedt, A. Delabie, C. Gottschalk, Marc M. Heyns, M. Green, S. Lin, Paul W. Mertens, W. Tsai, Chris Vinckier |
| Keywords |
Atomic Layer Deposition ALD, High-k, Interface, Oxide, Ozone |
| Full Paper |
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